Electrophoretic deposition of Ti02/Nb20S composite electrode thin films for photovoltaic application

Abstract

Nano-sized powders of titanium dioxide (TI02) and niobium (v) oxide (Nb2O5) were used to fabricate Ti02/Nb205 composites thin films by electrophoretic deposition (EPD) technique In EPD technique (hinged particles suspended in a liquid are forced to move towards and deposit on an oppositely charged electrode upon application of electric field. The Ti02 and Nb205 powders, together with magnesium nitrate hexahydrate pellets, were suspended in propan-2-ol inside an EPD cell. The electrodes, placed 1.2cm apart, were immersed in the suspension and a DC potential applied across them Kelt EPD process parameters, which Include applied DC electric field, deposition time, and solid concentration in suspension, were optimized through visual inspection and from UV-Vis-NIR spectrophotometer spectra. The deposited o thin film with highest transmittance were obtained using deposition time of 90s, powder concentration of 001g/40ml, and applied DC voltage of 35V This combination (90s, 0.01g/40mL, & 35V) became the optimum EPD values for fabricating Ti02/Nb205 composite thin films. The XRD micrographs confirmed that Ti02 and l\lb205 particles were present in the composite film Visual inspection of and SEM images of the composite electrode thin films showed that porous films of high quality with well controlled morphology can he deposited using the EPD technique.