Structure, Composition, and Morphology of Photoelectrochemically Active TiO2-xNx Thin Films Deposited by Reactive DC Magnetron Sputtering
Date
2004Author
Mwabora, JM
Lindgren, T
Avendaño, E
Jaramillo, TF
Lu, J
Lindquist, SE
Granqvist, CG
Type
ArticleLanguage
enMetadata
Show full item recordAbstract
Films of nitrogen-doped TiO2 were made by reactive DC magnetron sputtering in a mixture of argon, oxygen, and nitrogen. The nitrogen gas ratio Φ was varied in the 0 < Φ < 0.025 range during the depositions, resulting in TiO2-xNx films with 0 ≤ x ≤ 0.022 as determined by X-ray photoelectron spectroscopy. Structural and morphological properties of the films were investigated by X-ray diffraction, atomic force microscopy, and scanning and transmission electron microscopy. Films prepared without nitrogen had a rutile structure, while the nitrogen-doped films were either rutile or anatase depending on Φ being below or above 0.007. Deposition rate, effective grain size, root-mean-square roughness, morphology, and optical absorption were also found to depend on Φ. The films were photoelectrochemically active, as reported in an earlier papers of ours [J. Phys. Chem. B 2003, 107, 5709−5716 and J. Phys. Chem. B 2004, 108, 5995−6003].
URI
http://pubs.acs.org/doi/abs/10.1021/jp0368987http://erepository.uonbi.ac.ke:8080/xmlui/handle/123456789/35825
Citation
J. Phys. Chem. B, 2004, 108 (52), pp 20193–20198Publisher
American Chemical Society