Passivation of TiO2 by Ultra-thin alumina
dc.contributor.author | Dittrich, Th | |
dc.contributor.author | Muffler, HJ | |
dc.contributor.author | Vogel, M | |
dc.contributor.author | Guminskaya, T | |
dc.contributor.author | Ogacho, A | |
dc.contributor.author | Belaidi, A | |
dc.contributor.author | Strub, E | |
dc.contributor.author | Bohne, W | |
dc.contributor.author | Röhrich, J | |
dc.contributor.author | Hilt, O | |
dc.contributor.author | Lux-Steiner, MC | |
dc.date.accessioned | 2013-06-21T10:01:44Z | |
dc.date.available | 2013-06-21T10:01:44Z | |
dc.date.issued | 2005 | |
dc.identifier.citation | Applied Surface Science . 240 :236-243. | en |
dc.identifier.uri | http://profiles.uonbi.ac.ke/ogachoa/publications/passivation-tio2-ultra-thin-alumina | |
dc.identifier.uri | http://erepository.uonbi.ac.ke:8080/xmlui/handle/123456789/37410 | |
dc.description.abstract | Abstract not Available | en |
dc.language.iso | en | en |
dc.publisher | University of Nairobi | en |
dc.title | Passivation of TiO2 by Ultra-thin alumina | en |
dc.type | Article | en |
local.publisher | College Of Education And External Studies | en |
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