dc.contributor.author | Nguu, JN | |
dc.contributor.author | Nyongesa, FW | |
dc.contributor.author | Aduda, BO | |
dc.contributor.author | Musembi, RJ | |
dc.contributor.author | Njogu, S | |
dc.date.accessioned | 2015-03-04T09:49:41Z | |
dc.date.available | 2015-03-04T09:49:41Z | |
dc.date.issued | 2015 | |
dc.identifier.citation | Nguu JN, Nyongesa FW, Aduda BO, Musembi RJ, Njogu S. "Electrical Characterization of Nano-TiO2/Nb2O5 Composite Thin Films Deposited Using Electrophoretic Deposition Technique." International Journal of Innovative Research in Advanced Engineering (IJIRAE). 2015;2(2):2349-2163. | en_US |
dc.identifier.uri | http://hdl.handle.net/11295/80947 | |
dc.description.abstract | Abstract
This paper reports the results of electrical
characterization
of TiO
2
/Nb
2
O
5
composite thin films.
Uniform
TiO
2
and
Nb
2
O
5
composites thin films were deposited on FTO coated glass substrate using
electrophoretic deposition
(EPD) technique.
The
EPD
voltage of 35V (DC
) and deposition time of 90s, were used for various volume fractions of
Nb
2
O
5
in composites. Uniform and crack free composite films were successfully deposited using the EPD technique as
shown by the SEM micrographs.
The
Hall Effect
equipment was used to
characterize the films through measurement
of
current and
the
Hall voltage
Current against
Hall
voltage plot for
films of various volume fractions of
Nb
2
O
5
were
used to determine Hall coefficients
and majority charge
carrier
density.
The sign of Hall
coefficient values revealed
that
TiO
2
/Nb
2
O
5
composite thin films
had a net n
-
type
polarity
indicating electrons were
the majority
charge carrier
in
the
composite
films
The results
showed
that
dye
sensitized solar cells should be
fabricated with
TiO
2
/Nb
2
O
5
comp
o
sites thin
films in ratio of 1
:1 because such ratio
1:1 for
TiO
2
and
Nb
2
O
5
in composite
yielded the highest electron
mobility in the films | |
dc.language.iso | en | en_US |
dc.publisher | University of Nairobi | en_US |
dc.title | Electrical characterization of nano-tio2/nb2o5 composite thin films deposited using electrophoretic deposition technique | en_US |
dc.type | Article | en_US |
dc.type.material | en | en_US |