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dc.contributor.authorMulama, Austine A
dc.contributor.authorMwabora, Julius M
dc.contributor.authorOduor, Andrew O
dc.contributor.authorMuiva, Cosmas M
dc.contributor.authorWalloga, Chrispinus M
dc.date.accessioned2015-06-20T06:47:11Z
dc.date.available2015-06-20T06:47:11Z
dc.date.issued2014
dc.identifier.citationJOSR Journal of Applied Physics (JOSR-JAP) e-JSSN 2278-4861. Volume 6, Issue 5 Ver. J (Sep=Oct. 20J4), PP 01-06 11'11'w. iosrjournals. orgen_US
dc.identifier.uriww'w.iosrjournals. org
dc.identifier.urihttp://hdl.handle.net/11295/85255
dc.description.abstractAbstract: Flash evaporated amorphous Ga.Se i., (x = 0, I, 2, 3, and 4 atomic %) on glass substrates have bee. investigated within a 500nm-I500nm spectral range. Film thicknesses explored were; 200±IOnm, 265±IOnflJ. 330±IOnm, and 400±IOnm. The effect of film thickness and gallium content on the as-deposited thin films has been established. As the gallium content increases, both the optical transmittance and band gap energy decrease. Increase infilm thickness led to a decrease in optical transmittance and an increase in the band gap energy. The other optical parameters like the absorption coefficient, extinction coefficient, refractive index, red! pari and imaginary pari of dieleclric constant increase with increase in gallium content and film thickness.en_US
dc.language.isoenen_US
dc.subjectAmorphous thin film,en_US
dc.subjectFilm thickness,en_US
dc.subjectOptical propertyen_US
dc.titleEffect of Ga Incorporation and Film Thickness on the Optical Properties of as-Deposited Amorphous GaxSel-x Thin Filmsen_US
dc.typeArticleen_US
dc.type.materialenen_US


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